| 摘要 |
PURPOSE:To enable correct positioning by using positioning marks of respective different size at the time of performing registration etc. for small diameter beam and large diameter beam. CONSTITUTION:Registration is performed using a small mask 23 by small diameter beam 24 focusing electron beam and reflective electron signal from the mark 22 comes to have high resolving power at beam scanning by means of positioning an optical system and a sample, so positioning and lithographic parameter arrangement can be performed with high accuracy. Subsequently, the reflective electron signal from the mark 23 at the time of beam scanning is enough detectable level and also recognition of the mark 23 is possible by means that resistration is performing using a large marks 23 with a large diameter beam 25 while the electron beam is put out of focus. |
