Method of producing oxide ceramic layers on barrier layer-forming metals and articles produced by the method

摘要

A method of producing oxide ceramic layers on Al, Mg, Ti, Ta, Zr, Nb, Hf, Sb, W, Mo, V, Bi or their alloys by a plasma-chemical anodical oxidation in a chloride-free electrolytic bath having a pH value of 2 to 8 and a constant bath temperature of -30 DEG to +15 DEG C. A current density of at least 1 A/dm2 is maintained constant in the electrolytic bath until the voltage reaches a predetermined end value.