| 摘要 |
PURPOSE:To perform secondary ion-mass spectrometry on an insulator sample with high reproducibility and excellent efficiency by forming a conductive fine- particle layer on the surface of the sample and performing measurement by utilizing the surface layer. CONSTITUTION:The qualitative and quantitative analyses of an insulator sample are performed by irradiating the sample with a primary ion beam and drawing out secondary ions generated from the surface of the sample for mass spectrometry. Before measurement, a fine-particle layer of a conductive material is formed on the surface of the sample and the measurement is performed by using the layer. In order to obtain a uniform and flat fine-particle layer, it is desirable to control the particle size of the fine particles to <=0.005mum, most preferably, to <=0.03mum. The ion beam sputtering method or another method in which a solution containing an organic metal is applied to the surface of the insulator sample and baked is suitable to form the fine-particle layer. |
