发明名称 |
RADIATION SENSITIVE MIXTURE AND PRODUCTION OF RELIEF PATTERNS |
摘要 |
A radiation sensitive mixture suitable for producing relief patterns contains (a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and (b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and additionally a group which forms a strong acid on irradiation, wherein the polymeric binder (a) contains from 5 to 35 mol % of monomer units having acid labile groups as copolymerized or cocondensed units or acid labile groups introduced by polymer analogous reaction.
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申请公布号 |
CA1334059(C) |
申请公布日期 |
1995.01.24 |
申请号 |
CA19890598317 |
申请日期 |
1989.05.01 |
申请人 |
BASF AKTIENGESELLSCHAFT |
发明人 |
SCHWALM, REINHOLD;BINDER, HORST;BOETTCHER, ANDREAS |
分类号 |
G03F7/004;G03F7/039;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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