发明名称 METHOD FOR MANUFACTURING COLOR FILTER SUBSTRATE WITH ITO FILM ON BACK FACE
摘要 <p>PROBLEM TO BE SOLVED: To prevent contamination in the manufacture process for the top face side of a substrate even when a transparent conductive film such as an ITO film is formed on the back face. SOLUTION: A mask 24 is attached to one surface of a glass substrate 22 to be used as the back face side of a color filter having an ITO film on the back face, and ITO is deposited by sputtering from a target 23. During sputtering the ITO, the glass substrate 22 is kept at room temperature. Even when a resin pin 25 of a magnet holder 25 housing a magnet to hold the mask 24 by the magnetic force touches the other surface of the glass substrate 22, it does not cause contamination in the manufacture process for the top face side.</p>
申请公布号 JP2001311817(A) 申请公布日期 2001.11.09
申请号 JP20000130421 申请日期 2000.04.28
申请人 SHIN STI TECHNOLOGY KK 发明人 MATSUMOTO YASUO
分类号 G02B5/20;C23C14/04;C23C14/34;G02F1/1333;(IPC1-7):G02B5/20;G02F1/133 主分类号 G02B5/20
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