发明名称 Boride, carbide, nitride, oxynitride, and silicide infiltrated electrochemical ceramic films and coatings and the method of forming such
摘要 Ceramic films and coatings, single or multi-layered, including superlattice, infiltrated with boride, carbide, nitride, oxynitride, and silicide were formed by methods which comprises of an electrochemical coating of a ceramic precursor by a constant or an amplitude-modulated electric current with a DC component in a medium containing at least one of the ionic species for the composition of the ceramic precursor, following single or multiple infiltration in a medium containing at least one of the compounds selected from a B-containing compounds, a C-containing compounds, a N-containing compounds, a Si-containing compounds, and a mixture thereof, by heating means selected from radio-frequency, microwave, thermal, flame, plasma, laser, and a mixture thereof.
申请公布号 US5364522(A) 申请公布日期 1994.11.15
申请号 US19930035424 申请日期 1993.03.22
申请人 WANG, LIANG 发明人 WANG, LIANG
分类号 C25D5/50;C25D9/04;(IPC1-7):C25D5/50;C25D3/02 主分类号 C25D5/50
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