| 摘要 |
PURPOSE:To attain excellent resolution, profile shape, sensitivity and to suppress influence due to the reflected light from a substrate. CONSTITUTION:This resist composition is made by containing an alkali soluble resin (A), an alkoxymethylated amino resin (B), a triazine compound (C) expressed by a formula I (each of R<1>, R<2> and R<3> is hydrogen atom or lower alkyl group, (n) is 0 or 1) and, if necessary, a benzophenone based compound (D) expressed by a formula II (each of R<4> and R<5> is hydrogen atom or lower alkyl group, (m) is 1-3). |
