发明名称 |
Optical processing apparatus |
摘要 |
An optical processing apparatus utilizing multiple reflections of a light beam between a mask and a reflector has improved uniformity in the distribution of the light beam over a surface of the mask. In one form, the reflector is disposed in a face-to-face relation with respect to the mask with an angle of inclination relative thereto. In another form, the reflector has a flat or curved taper surface for decreasing an angle of reflection of the light beam at the mask surface at an initial stage, and a flat surface disposed in parallel with the mask surface. In a further form, the reflector is curved in a direction of transmission of the light beam. In a yet further form, an angle of incidence of the light beam is properly adjusted such that a portion of the light beam, which is first reflected from the mask and escapes outwardly from the reflector, is minimized. |
申请公布号 |
US5355194(A) |
申请公布日期 |
1994.10.11 |
申请号 |
US19920888782 |
申请日期 |
1992.05.27 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
ZUMOTO, NOBUYUKI;YAGI, TOSHINORI;MYOI, YASUHITO;MIYAMOTO, TERUO;TANAKA, MASAAKI;IZUMO, MASAO |
分类号 |
B23K26/00;B23K26/06;B23K26/38;G03F1/00;G03F1/08;G03F1/68;G03F7/20;H01S3/101;H05K3/00;(IPC1-7):G02B17/00 |
主分类号 |
B23K26/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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