Photoresist compositions comprising styryl compound

摘要

A photoresist composition which includes a sensitizing compound, a resin and, as a light absorber, a styryl compound of the formula: (I) or (II) (VI) wherein R1, R2 and R11 are the same or different and a hydrogen atom, an optionally substituted alkyl, alkenyl or aralkyl group or R1 and R2 may form a ring together with the nitrogen atom to which they are bonded, which ring may include at least one hetero atom in addition to said nitrogen atom; R10 is an optionally substituted alkylene group; R3 is -OH, -OCOR5 or -OSi(R5)3 in which R5 is an alkyl group; R12 and R13 are independently a hydrogen atom, an optionally substituted lower alkyl or alkoxy group, an amide group or a halogen atom; X, Y, W and Z are the same or different and an electron attracting group, and n is a number of 2-15.