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发明名称
Method for forming a self-aligned source/drain contact for a MOS transistor.
摘要
申请公布号
EP0334761(B1)
申请公布日期
1994.10.05
申请号
EP19890400823
申请日期
1989.03.23
申请人
SGS-THOMSON MICROELECTRONICS, INC. (A DELAWARE CORP.)
发明人
CHAN, TSIU CHIU, C/O SGS-THOMSON MICROELECTRONICS,;HAN, YU-PIN, C/O SGS-THOMSON MICROELECTRONICS,
分类号
H01L29/78;H01L21/28;H01L21/285;H01L21/336;H01L21/768;H01L21/8238;H01L21/8244;H01L27/092;H01L27/11;(IPC1-7):H01L21/28;H01L21/90;H01L21/60
主分类号
H01L29/78
代理机构
代理人
主权项
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