发明名称 |
Method of chemical vapor deposition in a continuous treatment line |
摘要 |
A reaction gas or a gas containing a reaction gas is blown through blowing nozzles onto a steel material in a chemical vapor deposition treating chamber at a velocity sufficient to forcibly remove reacted products from reacted surfaces of a steel material while suppressing irregular thickness of a deposited film.
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申请公布号 |
US5352490(A) |
申请公布日期 |
1994.10.04 |
申请号 |
US19920910827 |
申请日期 |
1992.07.06 |
申请人 |
NKK CORPORATION |
发明人 |
ABE, MASAHIRO;OKADA, KAZUHISA;FUKUDA, SHUZO |
分类号 |
C23C16/44;C23C16/455;C23C16/54;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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