发明名称 Method of chemical vapor deposition in a continuous treatment line
摘要 A reaction gas or a gas containing a reaction gas is blown through blowing nozzles onto a steel material in a chemical vapor deposition treating chamber at a velocity sufficient to forcibly remove reacted products from reacted surfaces of a steel material while suppressing irregular thickness of a deposited film.
申请公布号 US5352490(A) 申请公布日期 1994.10.04
申请号 US19920910827 申请日期 1992.07.06
申请人 NKK CORPORATION 发明人 ABE, MASAHIRO;OKADA, KAZUHISA;FUKUDA, SHUZO
分类号 C23C16/44;C23C16/455;C23C16/54;(IPC1-7):C23C16/00 主分类号 C23C16/44
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