发明名称 |
Ion-optical imaging system |
摘要 |
A system for ion-beam imaging of a structure of a mask on a wafer has a two-lens set between the mask and the wafer which is one of the following combinations: (a) two accelerating Einzel lenses; (b) an accelerating immersion lens and a decelerating immersion lens wherein the accelerating immersion lens is the first collecting lens following the mask; (c) an accelerating immersion lens and a decelerating asymmetric Einzel lens wherein the accelerating immersion lens is the first collecting lens following the mask; (d) an accelerating asymmetric Einzel lens and a decelerating immersion lens wherein the accelerating asymmetric Einzel lens is the first collecting lens following the mask; and (e) an accelerating asymmetric Einzel lens and a decelerating asymmetric Einzel lens wherein the accelerating asymmetric Einzel lens is the first collecting lens following the mask.
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申请公布号 |
US5350924(A) |
申请公布日期 |
1994.09.27 |
申请号 |
US19920912099 |
申请日期 |
1992.07.10 |
申请人 |
IMS IONEN MIKROFABRIKATIONS SYSTEMS GESELLSCHAFT M.B.H. |
发明人 |
STENGL, GERHARD;CHALUPKA, ALFRED |
分类号 |
G03F7/20;H01J37/30;H01L21/027;(IPC1-7):H01J37/317 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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