| 摘要 |
<p>The linear microwave source for the treatment of surfaces comprises: a sealed housing (1); means (B1, B2; A1, A2) to create a magnetic field in the housing and to generate a plasma sheet (P); coupling means between the microwave emission means and the housing (1); at least one target (2); pumping means (3); gas injection means (9) for the control of ionic species of the plasma sheet (P). Application particularly for the plasma treatment of surfaces.</p> |
