发明名称 Positive-working radiation-sensitive mixture.
摘要 <p>A novel positive-working radiation-sensitive mixture having a high sensitivity to radiation in a short-wavelength UV region is provided which can be developed in an aqueous alkaline solution, has a stable acid latent image and is used for the production of a semiconductor. The mixture comprises, as indispensable components, a) a binder insoluble in water but soluble in an aqueous alkaline solution, b) a compound having at least one bond cleavable with an acid, c) a compound capable of producing an acid upon radiation, and d1) a basic ammonium compound or d2) a basic sulfonium compound.</p>
申请公布号 EP0611998(A2) 申请公布日期 1994.08.24
申请号 EP19940102284 申请日期 1994.02.15
申请人 HOECHST JAPAN LIMITED 发明人 PRZYBILLA, KLAUS JUERGEN;DAMMEL, RALPH;PAWLOWSKI, GEORG;KUDO, TAKANORI HOECHST JAPAN LIMITED;MASUDA, SEIYA, HOECHST JAPAN LIMITED;KINOSHITA, YOSHIAKI, HOECHST JAPAN LIMITED;SUEHIRO, NATSUMI, HOECHST JAPAN LIMITED;PADMANABAN, MUNIRATHNA, HOECHST JAPAN LIMITED;OKAZAKI, HIROSHI, HOECHST JAPAN LIMITED;ENDO, HAJIME, HOECHST JAPAN LIMITED
分类号 G03F7/004;G03F7/039;(IPC1-7):G03F7/039 主分类号 G03F7/004
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