摘要 |
<p>A novel positive-working radiation-sensitive mixture having a high sensitivity to radiation in a short-wavelength UV region is provided which can be developed in an aqueous alkaline solution, has a stable acid latent image and is used for the production of a semiconductor. The mixture comprises, as indispensable components, a) a binder insoluble in water but soluble in an aqueous alkaline solution, b) a compound having at least one bond cleavable with an acid, c) a compound capable of producing an acid upon radiation, and d1) a basic ammonium compound or d2) a basic sulfonium compound.</p> |
申请人 |
HOECHST JAPAN LIMITED |
发明人 |
PRZYBILLA, KLAUS JUERGEN;DAMMEL, RALPH;PAWLOWSKI, GEORG;KUDO, TAKANORI HOECHST JAPAN LIMITED;MASUDA, SEIYA, HOECHST JAPAN LIMITED;KINOSHITA, YOSHIAKI, HOECHST JAPAN LIMITED;SUEHIRO, NATSUMI, HOECHST JAPAN LIMITED;PADMANABAN, MUNIRATHNA, HOECHST JAPAN LIMITED;OKAZAKI, HIROSHI, HOECHST JAPAN LIMITED;ENDO, HAJIME, HOECHST JAPAN LIMITED |