| 摘要 |
PURPOSE:To improve production efficiency by enabling simultaneous exposure of patterns of a pair of original plate films on both surfaces of a substrate with good accuracy. CONSTITUTION:An exposure section 4 which simultaneously exposes the patterns of a pair of the original plate films 1, 2 on both surfaces of the substrate 3, has a lower frame 8 which holds the lower original plate film 1, an upper frame 9 which is provided opposite to this lower frame and holds the upper original plate film 2, a pair of light sources 12, 13 for exposure which exist above and below both films, a first alignment means 10 which can adjuster the relative positional relation of both frames and a transparent electrode 15 which is provided on the transparent plate 14 of the lower frame 8. The substrate is attracted and held by the transparent plate 14 through the lower original plate film by static electricity when the transparent electrode is energized. There is thus no possibility of generating a mis-alignment. Both upper and lower surfaces of the substrate are simultaneously exposed with good accuracy when the light sources 12, 13 are turned on in this state. |
