发明名称 Diodo laser semicondutor, processo para produzir um contato ôhmico com um corpo semicondutor e contato ôhmico
摘要 A p-type ohmic contact layer (26) on a p-type II-VI semiconductor body is doped, with shallow acceptors having a shallow acceptor energy, to a net acceptor concentration of at least 1 x 10<1><7> cm<-><3>, and includes sufficient deep energy states between the shallow acceptor energy and the electrode layer Fermi energy to enable cascade tunneling by charge carriers. <IMAGE>
申请公布号 BR9205993(A) 申请公布日期 1994.08.02
申请号 BR19929205993 申请日期 1992.05.12
申请人 MINNESOTA MINING AND MANUFACTURING COMPANY 发明人 MICHAEL A. HAASE;HWA CHENG;JAMES M. DEPUYDT;JIN QIU
分类号 H01L21/363;H01L21/28;H01L29/43;H01L33/00;H01L33/14;H01L33/28;H01L33/38;H01L33/40;H01S5/00;H01S5/042;H01S5/22;H01S5/223;H01S5/30;H01S5/32;H01S5/327;H01S5/34;H01S5/347;(IPC1-7):H01S3/19 主分类号 H01L21/363
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