| 发明名称 |
Mask structure for x-ray exposure and x-ray exposure device and method using it |
| 摘要 |
A mask structure for X-ray exposure comprises a retaining frame, a supporting frame, a mask support and an absorber pattern. The mask structure possesses a function for detecting a state change of the mask structure from its steady state.
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| 申请公布号 |
US5333167(A) |
申请公布日期 |
1994.07.26 |
| 申请号 |
US19920984527 |
申请日期 |
1992.12.02 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
IIZUKA, TAKASHI;FUKUDA, YASUAKI |
| 分类号 |
G11B11/00;G03F7/20;G03F9/00;G21K1/06;H01L21/027;H01L41/08;(IPC1-7):G21K5/00 |
主分类号 |
G11B11/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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