发明名称 INSTRUMENT FOR MEASURING PLASMA EXCITED BY HIGH-FREQUENCY
摘要 <p>This instrument can measure parameters of a plasma accurately and easily even though the plasma is excited by a high-frequency. The instrument for measuring parameters of a plasma generated in a vacuum chamber by high-frequency discharge at a given frequency comprises a wire (106) for electrically connecting a first electrode (101) arranged in a space where a plasma is produced and a terminal (110) arranged outside the vacuum chamber for taking out signals, and a first insulator (105) so arranged as to cover at least a part of the surface of the wire therewith. The absolute value of the impedance at the given frequency between the first electrode and the ground when looking into the terminal side from the first electrode is five times or more the absolute value of the impedance at the given frequency between the first electrode and the plasma in a state where no direct current flows through the first electrode.</p>
申请公布号 WO1994016542(P1) 申请公布日期 1994.07.21
申请号 JP1994000046 申请日期 1994.01.14
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