发明名称 |
Oxidation/diffusion processing apparatus |
摘要 |
An oxidation/diffusion processing apparatus includes a processing vessel, arranged such that a longitudinal direction is vertical, for storing a plurality of target objects to be processed, a heater arranged around the processing vessel, for heating the interior of the processing vessel, a process gas supply mechanism for supplying a process gas from the lower portion of the processing vessel into the processing vessel, and an exhaust mechanism for exhausting a processed exhaust gas from the upper portion of the processing vessel. The process gas is supplied to the target objects heated to a predetermined temperature by the heater to perform oxidation/diffusion processing to the target objects.
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申请公布号 |
US5330352(A) |
申请公布日期 |
1994.07.19 |
申请号 |
US19930011372 |
申请日期 |
1993.01.29 |
申请人 |
TOKYO ELECTRON SAGAMI LIMITED;MITSUBISHI ELECTRIC CORPORATION |
发明人 |
WATANABE, SHINGO;JINTATE, SHINICHI |
分类号 |
H01L21/22;C30B31/16;H01L21/31;(IPC1-7):F27B9/04 |
主分类号 |
H01L21/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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