发明名称 Oxidation/diffusion processing apparatus
摘要 An oxidation/diffusion processing apparatus includes a processing vessel, arranged such that a longitudinal direction is vertical, for storing a plurality of target objects to be processed, a heater arranged around the processing vessel, for heating the interior of the processing vessel, a process gas supply mechanism for supplying a process gas from the lower portion of the processing vessel into the processing vessel, and an exhaust mechanism for exhausting a processed exhaust gas from the upper portion of the processing vessel. The process gas is supplied to the target objects heated to a predetermined temperature by the heater to perform oxidation/diffusion processing to the target objects.
申请公布号 US5330352(A) 申请公布日期 1994.07.19
申请号 US19930011372 申请日期 1993.01.29
申请人 TOKYO ELECTRON SAGAMI LIMITED;MITSUBISHI ELECTRIC CORPORATION 发明人 WATANABE, SHINGO;JINTATE, SHINICHI
分类号 H01L21/22;C30B31/16;H01L21/31;(IPC1-7):F27B9/04 主分类号 H01L21/22
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