| 摘要 |
<p>PURPOSE:To efficiently pattern a protein thin film with high accuracy by etching this protein thin film by using an aq. soln. of proteinase. CONSTITUTION:The protein thin film 2 is formed on a substrate 1 and a photoresist which is not decomposed by proteinase is applied by a spin coating method, etc., on the protein thin film 2. The coating film is dried to form a resist film 3. The resist film is subjected to exposure processing by using a exposure mask of prescribed patterns and to development processing to pattern the resist film 3 to shapes covering parts to constitute the color filters of the protein thin film 2. The parts of the protein thin film 2 not covered by the resist films 3 are etched by using the aq. soln. of the proteinase, by which the protein thin film 2 is patterned to the color filter shapes. then, the protein thin film 2 is efficiently etched in a short period of time. Since the etching time is short, the side etching of the protein thin film 2 is suppressed as well.</p> |
