| 摘要 |
A photosensitive polymer composition comprising a compound of the structure <IMAGE> wherein <IMAGE> is a polyvinyl acetal, n is an integer from 1 to 6, R is hydrogen or alkyl, m is an integer from 1 to 6, X is an anion, <IMAGE> is a divalent radical having the structure <IMAGE> Y is a monovalent radical having the structure <IMAGE> <IMAGE> where is a 5 or 6 membered heterocyclic ring in which Z is nitrogen, substituted nitrogen, oxygen or sulfur, and R1, R2, R3 and R4 are hydrogen, alkyl, alkenyl, alkoxy, aralkyl, substituted alkyl, substituted alkoxy, carboxy, carboxy ester, amino, substituted amino, amido, substituted amid, cyano, hydroxy, nitro, isocyanato, sulphonyl halide, sulphonic acid as halide, and may be the same or different or R1 taken together with R2 is methylenedioxy.
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