发明名称 MASK FOR SETTING MEASURING VISUAL FIELD OF INFRARED MICROSCOPE
摘要 <p>PURPOSE:To enable the visual observation of a sample through a visual field limiting mask for regulating the observation region of the sample with an IR microscope and to facilitate visual field setting for observation by forming a film of a material which is transparent to visible light and is non-transmittable in an IR region on a substrate transparent to visible light, thereby forming the mask. CONSTITUTION:The mask 1 consists of 4 sheets of mask wedges 1a to 1d, among which 1a and 1c are parallel, 1b and 1d are parallel with each other and are intersected orthogonally with 1a, 1c. The respective wedges la to 1d are respectively independently movable in the direction perpendicular to their inner edge angles. The mask aperture (h) is made square by such constitution. The value of the orthogonal two sides thereof and the central position of the aperture (h) are freely changeable. The base plates of the wedges 1a to 1d are ordinary sheet glass and the selective transmittable films which are transparent 10 the visible region and non-transmittable in the IR region are formed on these base plates. The visible light image by the objective minor of the sample and the mask overlap and are observed by an eyepiece lens system for visual observation when a light source for visible light observation is lighted.</p>
申请公布号 JPH06180425(A) 申请公布日期 1994.06.28
申请号 JP19920353363 申请日期 1992.12.11
申请人 SHIMADZU CORP;ASAHI GLASS CO LTD 发明人 ICHIMURA KATSUHIKO;MASUI AKIO
分类号 G01N21/27;G01N21/35;G02B5/26;G02B21/00;(IPC1-7):G02B21/00 主分类号 G01N21/27
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