| 摘要 |
<p>PURPOSE: To provide a resistive thin film which has both a specific resistivity larger than a specific value and a temperature coefficient within a specific range. CONSTITUTION: A resistive thin film contains 40-95 atomic % of carbon, 4-60 atomic % of one or more types of metal elements, and 1-30 atomic % of hydrogen, and hydrocarbon is not produced in the thin film. One to 95% of carbon can be partially replaced by one or more elements selected from a group consisting of silicon, boron and nitrogen for obtaining a further larger resistance value. The metal elements are preferably one or more metallic element selected from a 1st subfamily and 8th subfamily of the periodic table of elements and, particularly preferably, Ag, Pt, Au and/or Cu. With this constitution, a specific resistivity larger than in the case of CrSi can be obtained with the same temperature coefficient and further, a long-term stability can be improved significantly.</p> |
