| 摘要 |
PCT No. PCT/US91/03229 Sec. 371 Date Nov. 2, 1992 Sec. 102(e) Date Nov. 2, 1992 PCT Filed May 9, 1991 PCT Pub. No. WO91/17561 PCT Pub. Date Nov. 14, 1991.An apparatus (1) for continuous treatment of a material (M) of continuous length with a low temperature plasma of a plasma gas (G) under vacuum. The apparatus (1) includes a plasma treatment chamber (3) having a chamber wall (4) and, in the wall (4), an entrance zone (6) and an exit zone (7) for receiving and discharging the continuous material (M). Evacuating means (48) is operable to establish a vacuum in the chamber (3). Support means (9) advances the continuous material (M) along a path (8) through the chamber (3) and also maintains a vacuum seal at the entrance and exit zones (6,7). The support means (9) includes a backing roller (10) mounted adjacent the entrance and exit zones (6,7), an entrance sealing roller (11) positioned adjacent the entrance zone (6) and an exit sealing roller (13) positioned adjacent the exit zone (7). The backing roller (10) forms with each sealing roller (11,13) a respective nip (12,14) at the entrance and exit zones (6,7) through which the continuous material (M) passes into and out of the treatment chamber (3). A plasma generating head (53) is positioned within the treatment chamber (3) adjacent the path (8) for generating a low temperature plasma which contacts the continuous material (M) while it is advanced through the treatment chamber (3).
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