发明名称 Method and apparatus for cleaving a semiconductor wafer into individual die and providing for low stress die removal
摘要 The invention discloses a novel method and apparatus for cleaving semiconductor wafers into individual die which comprises mounting the wafer upon an adherent resilient air impermeable membrane while the latter is flat. Cleaving is achieved by using air pressure to inflate the membrane to cause bending and tensile stresses on the wafer brought about by its adhesion to the inflating membrane. These stresses cleave the wafer along the scribe marks to form individual die. The die may be easily removed by the application of a vacuum to the underside of the membrane which draws it against a perforated undulatory grid dimensioned according to the die dimensions to reduce the surface contact. This reduces adhesion of the die to the membrane to facilitate a low stress pick-off of the die.
申请公布号 US5310104(A) 申请公布日期 1994.05.10
申请号 US19910807584 申请日期 1991.12.16
申请人 GENERAL ELECTRIC COMPANY 发明人 ZAIDEL, SIMON A.;FABIAN, WALTER;BAXTER, BRIAN G.;MANONI, ALBERT J.
分类号 B26F3/00;B28D5/00;H01L21/301;(IPC1-7):B26F3/00;H01L21/78 主分类号 B26F3/00
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