发明名称 PHASE SHIFT MASK
摘要 PURPOSE:To provide the phase shift mask which suppresses the sub-peak generated in peripheral part light transmission regions and eliminates the problem arising from the sub-peak as the phase shift mask having the central light transmission regions allowing the transmission of exposing light by varying phases from each other and the peripheral light transmission regions. CONSTITUTION:This phase shift mask is constituted by having the central light transmission regions 12 of the shape having corner parts, such as rectangular shapes, and the peripheral light transmission regions 11 existing in the peripheral parts of the central light transmission regions and allowing the transmission of the light by varying the phase from the phase of the central light transmission regions 12 and by varying the light transmission quantity of the parts of the peripheral light transmission regions 11 corresponding to the corner parts of the central light transmission regions 12.
申请公布号 JPH0695357(A) 申请公布日期 1994.04.08
申请号 JP19920255791 申请日期 1992.08.31
申请人 SONY CORP 发明人 UESAWA FUMIKATSU
分类号 G03F1/29;G03F1/68;H01L21/027 主分类号 G03F1/29
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