| 发明名称 |
Method and apparatus for transfer of a reticle pattern onto a substrate by scanning |
| 摘要 |
A system and method for transferring a reticle (201) pattern to a substrate image (203) by scanning. The reticle is placed between an illumination system (118) and the projection lens (117). The substrate is located below the projection lens. A loading system, wafer adjustment system, and focusing system are also disclosed.
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| 申请公布号 |
US5298939(A) |
申请公布日期 |
1994.03.29 |
| 申请号 |
US19910788146 |
申请日期 |
1991.11.04 |
| 申请人 |
SWANSON, PAUL A.;GIBSON, JOHN A.;KNIRCK, JEFFREY G. |
发明人 |
SWANSON, PAUL A.;GIBSON, JOHN A.;KNIRCK, JEFFREY G. |
| 分类号 |
G03F7/20;G03F9/00;(IPC1-7):G03B27/42 |
主分类号 |
G03F7/20 |
| 代理机构 |
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