Multiple substrate holder e.g. for cathodic sputtering unit - provides identical masking and identical motion of substrates

摘要

Appts. is for simultaneously holding several substrates, with a slender circular cylindrical configuration and located in an evacuated coating chamber, e.g. a cathodic sputtering unit for uniformly partially coating the visible surfaces of the substrates. The chamber contains one or more storage arms or storage plates which can be coupled to a motor-driven shaft for rotation and which extend in a plane transvers to the rotational axis of the shaft. The storage plates have, in the region of their arcuate outer edges adjacent rotatably mounted friction rollers which cooperate with stationary track shoes and which roll on these track shoes when the storage plates rotate. A holder tube, for accommodating a substrate, is fixed to each friction axis of the driven shaft. ADVANTAGE - The appts. allows rapid mounting of substrates of complex three-dimensional configuration onto the substrate holder so that they are all identically covered by a mask for partial coating and are moved in an identical manner within the chamber. The appts. has a size suitable for incorporation in any conventional cathodic sputtering unit without any significant modification of the unit.