发明名称 |
Method of making an oxide superconducting thin film. |
摘要 |
<p>A method of making a superconducting thin film of a Y-Ba-Cu-O series material by using a diode parallel plate type sputtering apparatus including a vacuum chamber (1), a substrate (6) disposed within the vacuum chamber and having a substantially flat surface on which the superconducting thin film is to be formed, and a plate-shaped target (5) functioning as a cathode and disposed within the vacuum chamber to parallelly face to the flat surface of the substrate, the target being made of the same material as the superconducting thin film, a plasma gas being introduced into the vacuum chamber, and a voltage being applied between the cathode and the substrate, wherein the method comprises the steps of applying a high frequency voltage having a frequency higher than 40 MHz between the cathode and the substrate to generate plasma of the introduced gas, superimposing a DC voltage (V) on the high frequency voltage in a polarity that the cathode becomes negative, and setting the DC voltage at a value where the DC voltage is substantially unchanged with variation of a cathode current flowing through the target when adjusting the DC voltage and controlling a value of the DC current while maintaining the DC voltage substantially at the set value. <IMAGE></p> |
申请公布号 |
EP0587095(A2) |
申请公布日期 |
1994.03.16 |
申请号 |
EP19930114284 |
申请日期 |
1993.09.06 |
申请人 |
NIPPON STEEL CORPORATION;INTERNATIONAL SUPERCONDUCTIVITY TECHNOLOGY CENTER;MITSUBISHI ELECTRIC CORPORATION;HOKKAIDO ELECTRIC POWER CO., INC. |
发明人 |
ITO, WATARU;MORISHITA, TADATAKA;HOMMA, NORIO;YOSHIDA, YUKIHISA |
分类号 |
C01G1/00;C01G3/00;C23C14/08;C23C14/35;C23C14/46;C30B29/22;H01L39/24;(IPC1-7):H01L39/24;C04B35/50 |
主分类号 |
C01G1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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