| 摘要 |
<p>PURPOSE:To provide a liquid crystal display device which has a high throughput and a high yield and is improved in display quality by forming a pixel electrode by metal dry etching and oxidation at a matrix array formed in a transparent insulating substrate. CONSTITUTION:For the formation of the pixel electrode of the liquid crystal display device, the pixel electrode 15 is formed preferably by dry etching in the structure wherein the pixel electrode 15 and a data line 13 are formed in different layers and the pixel electrode 15 is positioned in the upper layer, but an ITO film is low in etching rate which causes the decrease in throughput. Thus, the transparent pixel electrode 15 is formed by patterning indium by dry etching and then performing oxidation. Therefore, the throughput is improved since the pixel electrode 15 is patterned by the dry etching of indium. Aluminum with low resistance is usable for lower-layer wiring and an open circuit due to the entry of an etchant is not caused, so the yield and display quality are improved.</p> |
