| 摘要 |
<p>PURPOSE:To provide a mask for exposure which easily solves the problem of a shift of the pattern due to warpage caused in the case where a light shielding film is formed on the surface of the substrate. CONSTITUTION:In a mask 1 for exposure with a light shielding film 2 on the periphery of the surface of the substrate 10, the light shielding film 2 is divided with slits 3, etc. When this mask for exposure is formed as a negative pattern mask, the precision of superposition on a positive pattern mask is enhanced.</p> |
