Photosensitive polymer composition

摘要

A photosensitive polymer composition comprising, in admixture, a polymer predominantly comprising a recurring unit of the formula (I): (* CHEMICAL STRUCTURE *) (I) wherein x is a tri- or tetravalent organic group, Y is a divalent organic group, and n is equal to 1 or 2 and a compound having a urea bond of the formula (II): (* CHEMICAL STRUCTURE *) (II) wherein R1 is a group having a functional group capable of forming a dimer or polymer upon exposure to radiation, R2 and R3 are independently a hydrogen atom or a monovalent organic group is shelf stable and applicable as relatively thick coatings having sufficient photosensitivity to form semiconductor element surface protective films.