发明名称 Method of treating halogenated polyimide substrates for increasing adhesion of metal layer thereon
摘要 Method of producing a polyimide layer having improved adhesion to a metal layer thereon. A halogenated polyamic acid is sprayed, partially cured, degreased and oxidized to form a partially cured polyimide layer, which is then electrolessly plated with a primary metal layer and then final cured into the polyimide layer. Electrolessly or electrolytically applied secondary metal layers are then deposited on the primary layer, until the metal layer of a desired thickness is attained. The present invention further discloses articles such as an EMI shielded enclosure and an insulated mold surface, having metal layers as an EMI shield and an insulating surface, respectively.
申请公布号 US5290597(A) 申请公布日期 1994.03.01
申请号 US19920874448 申请日期 1992.04.27
申请人 GENERAL ELECTRIC COMPANY 发明人 BAUMGARTNER, CHARLES E.;SCOTT, LISA R.
分类号 B32B15/088;C08G73/10;C08J7/12;C09D179/08;C23C18/20;C23C18/52;C25D5/56;H05K1/03;H05K3/18;H05K3/38;(IPC1-7):B05D1/00 主分类号 B32B15/088
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