Microstructuring substrate surface - by casting shadow of beam of atom agglomerates onto surface

摘要

Microstructuring a substrate surface comprises using a mask, which is applied on to the substrate or laid on it, or kept at a certain distance from it, and formed by casting shadows onto the substrate surface. The novelty is that the shadows are cast onto the substrate surface using a beam of atom agglomerates. The beam is partially ionised before casted as shadow, electrically accelerated and/or electromagnetically adjusted. The agglomerates and/or agglomerate ions partially erode the material of the substrate surface at unmasked sites corresponding to the duration of the impingement with the beam. A material for the mask is chosen so that it suffers essentially low erosion by the beam of agglomerates or accelerated agglomerate ions. USE/ADVANTAGE - For prodn. of microtechnical parts. Reaction rate of chemical etching is increased.