EVALUATION APPARATUS AND METHOD FOR SEMICONDUCTOR MANUFACTURING APPARATUS

摘要

PURPOSE:To obtain an evaluation apparatus and method of a semiconductor manufacturing apparatus for evaluating characteristics of an aligner by a method where a photoresist is exposed through a photomask mounted on an & to form a conducting film on a semiconductor substrate and a resistance value thereof is measured. CONSTITUTION:A photomask as illustrated shows a mask pattern of a reticle which is used in an aligner such as stepper and projected into an exposure area 32. The mask pattern comprises a plurality of blocks (subchips) 31 equal in the shape of patterns and the respective blocks 31 have a plurality of resistance measuring patterns and sheet resistance measuring patterns as required. The blocks 31 are arranged within the reticle and resistance chant of the blocks 31 are compared to evaluate a lens of the aligner.