发明名称 |
Base-soluble polyimide release layers for use in microlithographic processing |
摘要 |
Base-soluble release layer compositions for microlithographic processing, comprising nonamic acid functionalized polyamic acid/imide resins are disclosed. These materials permit concurrent lithographic development of photoresist and release layers. They also afford effective lift-off, by alkaline media, even after high imidization.
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申请公布号 |
US5281690(A) |
申请公布日期 |
1994.01.25 |
申请号 |
US19890330795 |
申请日期 |
1989.03.30 |
申请人 |
BREWER SCIENCE, INC. |
发明人 |
FLAIM, TONY;LAMB, III, JAMES E.;BARNES, GREGG;BREWER, TERRY |
分类号 |
C08G73/10;C08L63/00;G03F7/09;(IPC1-7):C08G69/26;C08G8/02 |
主分类号 |
C08G73/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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