发明名称 VIA HOLE FORMING METHOD BY LASER ABRASION
摘要 PURPOSE:To prevent a dispersion medium generated by a laser abrasion from adhering to the inside of a via hole or the surface of a resin film by allowing gas of N2, etc., to flow. CONSTITUTION:A via hole 3 is formed on a resin film 2 of a base plate 1. By irradiating a prescribed position with a laser light 7 through a transparent mask 5 formed with a multilayered reflecting film 6, a laser abrasion is executed. In this case, by allowing a gas flow 9 of N2, O2, He, etc., to flow to a gas flow passage formed between the mask 5 and the base plate 1, a decomposition product generated from the resin film 2 by the laser abrasion is eliminated. In this case, when the direction of the gas flow 9 is set not to be opposite the advance direction of the laser light 7, adherence of the decomposition product of the resin film 2 by the laser abrasion to the formed via hole and the surface of an insulating film is prevented.
申请公布号 JPH0615472(A) 申请公布日期 1994.01.25
申请号 JP19920177943 申请日期 1992.07.06
申请人 FUJITSU LTD 发明人 SHIMIZU KANAE;YAMAGISHI YASUO;OWADA TAMOTSU;MIZUTANI DAISUKE;KURAMITSU YOKO
分类号 B23K26/00;B23K26/14;B23K26/38;H05K3/00;H05K3/46 主分类号 B23K26/00
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