首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
SEMICONDUCTOR DEVICE
摘要
申请公布号
JPH0613465(A)
申请公布日期
1994.01.21
申请号
JP19920167862
申请日期
1992.06.25
申请人
SEIKO EPSON CORP
发明人
KOBAYASHI MASANORI
分类号
H01L21/82;H01H85/04;H01L21/768;H01L21/822;H01L23/522;H01L27/04;(IPC1-7):H01L21/82;H01L21/90
主分类号
H01L21/82
代理机构
代理人
主权项
地址
您可能感兴趣的专利
PROTECTOR
ON-VEHICLE RADIO EQUIPMENT
EMBEDDED POWER OUTLET DEVICE
SINGLE-CHIP DATA PROCESSOR, MICROCOMPUTER AND MICROPROCESSOR
HIGH SERVICEABILITY LIQUID LOOP COOLING SYSTEM USING TUBING HINGE
HEAT EXCHANGER WITH FLOW STRAIGHTENING FIN
STRUCTURE OF FITTINGS TO BE PROVIDED IN ESCAPE ROOM
HEAT-SEALER AND BAG-MAKING AND PACKAGING MACHINE EQUIPPED WITH THE SAME
CHARACTERISTIC OPTIMIZATION METHOD FOR ADAPTIVE ARRAY
POLYCAPROLACTONE COPOLYMER, ITS UTILIZATION METHOD, ITS MANUFACTURING METHOD AND MANUFACTURING EQUIPMENT
CHEMICAL FILTER AND METHOD FOR PRODUCING THE SAME
REUSABLE TRAY-TYPE ADSORPTION FILTER AND BOLT-NUT FASTENING METHOD THEREFOR
GOLF CLUB HEAD
POWER CONTROLLER FOR VEHICLE
PHASED ARRAY ANTENNA SYSTEM AND BEAM CONTROLLING METHOD FOR PHASED ARRAY ANTENNA
DISPLAY PANEL AND DISPLAY DEVICE
ACTIVATOR OF MACROPHAGE, METHOD FOR PRODUCING THE SAME AND METHOD FOR SCREENING THE SAME
GLASS SUBSTRATE FOR MASK BLANK, MASK BLANK, METHOD FOR PRODUCING GLASS SUBSTRATE FOR MASK BLANK, AND POLISHING DEVICE
WASTE MATERIAL COLLECTION MANAGEMENT SYSTEM, WASTE MATERIAL COLLECTION MANAGEMENT METHOD, AND WASTE MATERIAL COLLECTION MANAGEMENT PROGRAM
GAME MACHINE