发明名称
摘要 PURPOSE:To restrain the occurrence of a fracture including a cut and a chip in a bevelling device for finishing the periphery of a wafer by moving the wafer rotating with a feed roller to a workpiece machining position with a guide roller. CONSTITUTION:A semi-conductor wafer 11 is retained at both sides by a pair of guide members 12 having a deep groove 12a, supported by a feed roller 13 of special rubber make and having a deep groove 13a, kept in posture between the guide members 12 opposite to each other in a rotary direction, given a rotary force by the rotation of the roller 13 and machined in peripheral edge on a grinding roller 14. In this case, the wafer 11 gets in contact with the grinding roller 14 due to the own weight during a machining process and the grinding roller 14 undergoes extremely low and constant pressure. Consequently, a fracture including a crack, a cut and a chip liable to occur during the machining process can be restrained substantially.
申请公布号 JPH064216(B2) 申请公布日期 1994.01.19
申请号 JP19850273324 申请日期 1985.12.06
申请人 TOSHIBA CERAMICS CO 发明人 TORII HIROSHI;TEZUKA SABURO;MISU SHUICHI
分类号 B24B9/00;B24B9/06;H01L21/304;(IPC1-7):B24B9/00 主分类号 B24B9/00
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