| 摘要 |
PURPOSE:To improve the detection sensitivity of defects and to preclude misdecision making and enable fast pattern inspection by analyzing defect candidates stored in an image memory in detail and excluding suspected defects which are not destructive of practical use, and deciding the remaining defect candidates as real defects. CONSTITUTION:A pattern image of a mask 11 to be inspected which is mounted on an XY stage 12A is detected by an image pickup device 14A and converted into an electric video signal. A reference pattern is generated by a bit pattern generator 16 with reference data recorded in a reference data memory 18 and compared by a defect candidate decision part 15 with the video signal from the image pickup device 14A in real time to perform defect decision processing. Thus, '1st screening' is performed and a control and processing part 19 analyzes patterns including peripheries of the detected defect candidates in detail for '2nd screening' for excluding detect candidates which are not destructive of practical use from the defect candidates, thereby detecting the real defects. Consequently, the detection sensitivity is improved greatly and misdecision making is precluded. |
