Vacuum arc deposition device

摘要

A vacuum arc deposition device comprising a vacuum vessel with a vacuum arc evaporation source disposed in the vacuum vessel, a plurality of arc current introduction portions are disposed to the vacuum arc evaporation source along with a plurality of arc discharge power sources for supplying arc electric power correspondingly to the plurality of arc current introduction portions. The vacuum arc vapor deposition device provides a large evaporation area and a high film formation rate.