| 摘要 |
<p>PURPOSE:To provide a light exposure device where a pattern is prevented from being irregularly transferred in form and from being transferred out of position by making a substrate flat even if it is curled. CONSTITUTION:A disc-shaped stage main body where a wafer 8 is placed is divided into cylindrical segments 9a to 9e arranged in a concentrical manner, the tops of the segments 9a to 9e are adjusted in height conforming to the curve of the wafer 8 so as to come into contact with the wafer 8, and the wafer 8 is hold as being sucked. The segments 9a to 9e are made to recover their initial positions holding the wafer 8 to make the surface of the wafer 8 flat and hold it.</p> |
