| 摘要 |
<p>PURPOSE:To effectively remove HCl in high temp. exhaust gas with equipment which is manufactured at low cost. CONSTITUTION:In the 1st reactor 3, high temp. exhaust gas is cooled to a low temp. and simultaneously humidified by cold water spraying and given dry desalting by spraying a powdery desalting agent from nozzles 5, 6. Next, in the 2nd reactor 8, after the exhaust gas is given semi-dry desalting by spraying (9) dilute anionic alkaline water solution, it is given solid-gas separation by a bag filter 11 together with the reactional product and unreacted material.</p> |
