摘要 |
A photosensitive material for screen processing comprising a photosensitive resin composition (A) applied to a plastic film, and including a water-soluble or water-dispersible polymer or copolymer, an unsaturated compound, and a photopolymerization initiator, and a photosensitive resin composition (B) applied in a thickness of at least 0.1 mu m to the coated composition (A) and including a film-forming polymeric compound; and a photo-crosslinking polyvinyl alcohol partially containing photo-cross-linkable units provides a coating film which is water-developable, highly sensitive, and excellent in water and solvent resistances.
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