| 摘要 |
<p>PURPOSE: To produce an embossing die adapted to a relief by having high accuracy by etching the respective regions of a metallic sheet lying across between plural regions which are cured in a photoresist layer and have etching resistance. CONSTITUTION: The one surface of the planar metallic sheet 2 is provided with a film having the photoresist layer and relief patterns and this film is subjected to exposure processing, by which the metallic sheet 2 formed with exposed and cured regions in the photoresist layer is obtained. The metallic sheet 2 is wound like a sleeve on a roll in the state of directing the exposed and cured regions to an outer side and the regions 24 exclusive of the exposed and cured regions 24 are etched while the roll is rotated in the state of keeping the metallic sheet kept immersed in the etching bath and thereafter, the exposed and cured regions are removed. The desired relief patterns are formed on the metallic sheet and are fitted to a die roll 28. Edges 18 and 20 are fitted to the die roll 28 and are connected thereto by spot welding 30 by means of a welding tool 32. As a result, the embossing die may be produced without the occurrence of distortion or deformation.</p> |
