VERFAHREN ZUM AUFBRINGEN EINER UV- UND/ODER ELEKTRONENSTRAHLEMPFINDLICHEN LACKSCHICHT

摘要

In the prior art, lacquer films sensitive to UV and/or electron-beam radiation are applied as masking coatings to substrates by a spin-on process. In the method proposed, a vinyl-containing substance is first vaporized, together with a straight-chain or cyclic siloxane, and then deposited from the gas phase on to the substrate to be masked. A preferred embodiment of the invention concerns the use of octamethylcyclotetrasiloxane and trivinylmethylsilane.