发明名称 MANUFACTURE OF RESIST
摘要 PURPOSE:To improve tenting property by reducing oxygen from a through hole using the photosensitive layer of a photosensitive element. CONSTITUTION:A photosensitive liquid is formed by compounding a methyl methacrylate/acrylic acid copolymer, trimethylolpropane triacrylate, tetraethyleneglycol diacrylate, 2,6-bis(p-diethylamino)-benzylidene-4-methyl- azacyclohexane, N-phenylglycine, diphenylacetic acid, hydroquinone and acetone. A photosensitive element is obtained by forming a photosensitive layer which is obtained by applying the above-mentioned photosensitive liquid on polyethylene terephthalate and by drying it up. Besides, a polyethylene film of 25mum is pressure-laminated thereon. Then, the above-mentioned photosensitive element is laminated on both-face-copper-clad laminated plate, having a through hole, under the following condition, the degree of vacuum: 60mmHg, the lamination speed: 1m/min. After the above-mentioned material has been left in atmospheric air of 22 deg.C for two hours, it is exposed and a developing treatment is conducted by spraying a sodium carbonate aqueous solution.
申请公布号 JPH05191014(A) 申请公布日期 1993.07.30
申请号 JP19920005582 申请日期 1992.01.16
申请人 HITACHI CHEM CO LTD 发明人 KANEKO FUTAMI;KAJI MAKOTO;ISHIMARU TOSHIAKI
分类号 G03F7/20;G03F7/26;H05K3/06;H05K3/42 主分类号 G03F7/20
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