| 摘要 |
PURPOSE:To obtain a projection aligner provided with a position detection means wherein a reticle can be aligned with a wafer with high accuracy. CONSTITUTION:When a pattern on the face of a first object 1 irradiated with a beam of exposure light is projected, by using a projection lens 3, onto a photosensitive layer on the face of a second object 4 placed on a movable stage, at least two stepped faces which nearly correspond to a color aberration amount on an axis by the difference in a wavelength between the beam of exposure light of the projection lens and a beam of alignment light are provided on the movable stage by using the beam of alignment light whose wavelength is different from that of the beam of exposure light and which is not sensitive to the photosensitive layer. In addition, a stepped member 6 on which an alignment mark has been formed is placed on each stepped face; the alignment mark on each stepped face of the stepped member is detected by using a position detection means 15 via the projection lens; the first object 1 is aligned relatively with the second object 4 by utilizing a signal from the position detection means. |
