发明名称 Compound semiconductor device and method for fabrication thereof
摘要 A compound semiconductor device including a field effect transistor particularly suited for high frequency applications such as grounded source applications. An active layer is formed on one surface of a compound semiconductor substrate. An aperture is dry etched through the second surface of the semiconductor substrate toward the first surface, and terminates in the source region of the active layer. The walls of the aperture are metallized as is the second surface of the substrate. A gate electrode and at least a drain electrode are formed on the first surface. The metallized second surface can act as a source electrode by virtue of ohmic contact between the metallized walls of the aperture and the source region of the active layer.
申请公布号 US5236854(A) 申请公布日期 1993.08.17
申请号 US19910813479 申请日期 1991.12.26
申请人 HIGAKI, YUKIO 发明人 HIGAKI, YUKIO
分类号 H01L29/417;H01L29/812 主分类号 H01L29/417
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