| 摘要 |
PURPOSE:To enhance the yield in fabricating devices and enhance the resolution of element by forming a photoconductive layer from an amorphous semiconductor containing silicon as main component. CONSTITUTION:A electrode 3a is formed on a glass board 7a, which becomes a clear base board, and is installed in an ECL (electron cyclotron resonance) device, followed by evacuation to form a photoconductive layer 1 consisting of amorphous silicon. This is taken out of the ECR device and transferred to an electron beam evaporating device to form a dielectric mirror layer 5 which becomes a photo-reflex layer, and thereover an orientation film 6a is placed which was subjected to molecule orientation process by means of rubbing. Another glass board 7b which is provided in advance and on which an orientation film 6b/transparent electrode film 3b are laminated, is affixed to the abovementioned glass board 7a with orientation plate 6a put thereover where two spacers 10 are interposed, and liquid crystal is poured into the space to form a liquid crystal layer 2.
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